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Bis(fluoroalcohol) Monomers and Polymers: Improved Transparency Fluoropolymer Photoresists for Semiconductor Photolithography at 157 nm

机译：双（氟代醇）单体和聚合物：改进的透明性含氟聚合物光致抗蚀剂，用于157 nm的半导体光刻

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Andrew E. Feiring; Michael K. Crawford; William B. Farnham; Roger H. French; Kenneth W. Leffew; Viacheslav A. Petrov; Frank L. Schadt Iii; Hoang V. Tran; Fredrick C. Zumsteg;
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1. Bis(fluoroalcohol) Monomers and Polymers:Improved Transparency Fluoropolymer Photoresists for Semiconductor Photolithography at 157 nm [J] . Andrew E.Feiring, Michael K.Crawford, William B.Farnham, Macromolecules . 2006,第4期

机译：双（氟代醇）单体和聚合物：用于157 nm半导体光刻的透明性更高的含氟聚合物光刻胶
2. Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency [J] . Roger H. French, Robert C. Wheland, Weiming Qiu, Journal of Fluorine Chemistry . 2003,第1期

机译：在157 nm半导体光刻中用作防护薄膜的新型氢氟烃聚合物：透明性的基础
3. New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and Non-Fluorinated Tricyclononenes.Semiconductor Photoresists for Imaging at 157 and 193 nm [J] . Andrew E.Feiring, Michael K.Crawford, William B.Farnham, Macromolecules . 2006,第9期

机译：四氟乙烯与氟化和非氟化三环壬烯的新型非晶态含氟聚合物。半导体光刻胶在157和193 nm处成像
4. Synthesis of Novel Fluoropolymer for 157nm Photoresists by Cyclo-polymerization [C] . Shun-ichi Kodama, Isamu Kaneko, Yoko Takebe, Advances in Resist Technology and Processing XIX . 2002

机译：循环聚合法合成用于157nm光刻胶的新型含氟聚合物
5. Synthesis, copolymerization studies and 157 nm photolithography applications of 2-trifluoromethylacrylates. [D] . Trinque, Brian C. 2003

机译：2-三氟甲基丙烯酸酯的合成，共聚研究和157 nm光刻应用。
6. Microfluidic Long-Term Gradient Generator with Axon Separation Prototyped by 185 nm Diffused Light Photolithography of SU-8 Photoresist [O] . Nobuyuki Futai, Makoto Tamura, Tomohisa Ogawa, 2019

机译：SU-8光刻胶的185 nm扩散光光刻技术原型制作的具有轴突分离的微流体长期梯度发生器
7. New Amorphous Fluoropolymers of Tetrafluoroethylene with Fluorinated and Non-Fluorinated Tricyclononenes. Semiconductor Photoresists for Imaging at 157 and 193 nm [O] . Andrew E. Feiring, Michael K. Crawford, William B. Farnham, 2006

机译：四氟乙烯与氟化和非氟化三环壬烯的新型无定形含氟聚合物。半导体光刻胶用于157和193 nm的成像
8. Organometallic NLO Polymers. 3. Copolymerization of Bridged Bis(ferrocenyl) and Bis(cyanoacetate) Monomers via the Knoevenagel Condensation. [R] . Wright, M. E., Sigman, M. S. 1992

机译：有机金属NLO聚合物。 3.通过Knoevenagel缩合共聚合桥联双（二茂铁基）和双（氰基乙酸酯）单体。

Bis(fluoroalcohol) Monomers and Polymers: Improved Transparency Fluoropolymer Photoresists for Semiconductor Photolithography at 157 nm

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