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An analytic model for channel potential and subthreshold swing of the symmetric and asymmetric double-gate MOSFETs

机译:对称和非对称双栅MOSFET的沟道电势和亚阈值摆幅的解析模型

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摘要

An analytical model for channel potential and subthreshold swing of the symmetric and asymmetric double-gate Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) is presented. Two-dimen-sional Poisson equation is solved analytically using series method and channel potential is obtained. The analytical expression for subthreshold swing is achieved. Model results are compared with Medici simulation results, both of them turn out to agree very well. The results show the variation of channel potential and subthreshold swing with channel length, gate bias, and oxide thickness, which will provide some guidance for the integrated circuit designs.
机译:提出了对称和不对称双栅极金属氧化物半导体场效应晶体管(MOSFET)的沟道电势和亚阈值摆幅的分析模型。用级数法解析求解二维泊松方程,得到通道势。获得了阈下摆动的解析表达式。将模型结果与Medici仿真结果进行了比较,两者都非常吻合。结果表明沟道电势和亚阈值摆幅随沟道长度,栅极偏置和氧化物厚度的变化,这将为集成电路设计提供一些指导。

著录项

  • 来源
    《Microelectronics journal》 |2011年第3期|p.515-519|共5页
  • 作者单位

    ASIC and System State Key Lab, School of Microelectronics, Fudan University, Shanghai 200433, PR China;

    ASIC and System State Key Lab, School of Microelectronics, Fudan University, Shanghai 200433, PR China;

    ASIC and System State Key Lab, School of Microelectronics, Fudan University, Shanghai 200433, PR China;

    ASIC and System State Key Lab, School of Microelectronics, Fudan University, Shanghai 200433, PR China;

    ASIC and System State Key Lab, School of Microelectronics, Fudan University, Shanghai 200433, PR China;

    ASIC and System State Key Lab, School of Microelectronics, Fudan University, Shanghai 200433, PR China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    metal-oxide-semiconductor; field-effect; transistor; double-gate; subthreshold swing;

    机译:金属氧化物半导体场效应晶体管双闸阈下摆动;

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