首页> 外国专利> Method for fabricating asymmetric double-gate transistors by which asymmetric and symmetric double-gate transistors can be made on the same substrate

Method for fabricating asymmetric double-gate transistors by which asymmetric and symmetric double-gate transistors can be made on the same substrate

机译:制造不对称双栅极晶体管的方法,通过该方法可以在同一基板上制造不对称和对称双栅极晶体管

摘要

A method for fabricating a microelectronic device with one or several asymmetric and symmetric double-gate transistors on the same substrate.
机译:一种用于在同一基板上具有一个或几个不对称和对称双栅晶体管的微电子器件的制造方法。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号