MOLECULAR DYNAMICS SIMULATION OF GEL FORMATION AND ACID DIFFUSION IN NEGATIVE TONE CHEMICALLY AMPLIFIED RESISTS

摘要

The Knowledge of structural changes that occur during the lithographic process using chemically amplified resists (CARs) is of great importance in process and resist optimization. Molecular dynamics (MD) is a suitable method for the simulation of these microscopic changes. A detailed description of the lithographic procedure including reaction propagation, acid diffusion, cage effects, free volume effects and developer selectivity can be included in such a model. The comparison of contrast curve data and acid diffusion measurements with MD modeling, leading to the evaluation of microscopic parameters are presented in this paper.