Hot-carrier-induced interface state generation in submicrometer reoxidized nitrided oxide transistors stressed at 77 K

摘要

The hot carrier degradation at 77 K of silicon MOSFETs fabricated with reoxidized nitrided oxide (ONO) gate dielectrics has been investigated. Measurements have been performed at both room and LN/sub 2/ temperatures on n-channel FETs for both ONO and conventional SiO/sub 2/ films. It is found that the hot-carrier immunity of ONO transistors is substantially larger than that of conventional SiO/sub 2/ devices, and that the degree of improvement is much larger at room temperature that an 77 K. While the interface state generation does increase dramatically as a result of 77-K stressing, the dominant degradation mechanism can be attributed to a large increase in the drain resistance of the device due to localized charge trapping at the drain side of the channel.