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首页> 外文期刊>IEEE Transactions on Electron Devices >A novel on-chip electrostatic discharge (ESD) protection with common discharge line for high-speed CMOS LSIs
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A novel on-chip electrostatic discharge (ESD) protection with common discharge line for high-speed CMOS LSIs

机译:一种新颖的带有公共放电线的片上静电放电(ESD)保护,适用于高速CMOS LSI

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摘要

A novel on-chip electrostatic discharge (ESD) protection for high-speed CMOS LSI's that operate at higher than 500 MHz has been developed. Introduction of a newly developed common discharge line (CDL) can completely eliminate the protection device influence on the inner circuit operation. This enables minimization of the I/O capacitance by shrinking the dimension of the output transistor, which also serves as a protection device in conventional devices. This new protection (CDL protection) was applied to a high-speed DRAM of which I/O pin capacitance specification is 2 pF. As a result, the ESD tolerance of 4 kV for the charged device model test, 4 kV for the human body model test, and 700 V for the machine model test were obtained. In addition, the DRAM data rate higher than 660 MHz at room temperature was achieved. The results show significant improvement for both ESD and the I/O capacitance, compared with the conventional structure.
机译:已经开发了一种新颖的片上静电放电(ESD)保护,用于在高于500 MHz的频率下工作的高速CMOS LSI。引入新开发的通用放电管线(CDL)可以完全消除保护装置对内部电路运行的影响。这样可以通过缩小输出晶体管的尺寸来最大程度地减小I / O电容,该输出晶体管在传统设备中也可用作保护器件。这项新的保护(CDL保护)应用于I / O引脚电容规格为2 pF的高速DRAM。结果,充电设备模型测试的ESD容限为4 kV,人体模型测试的ESD容限为4 kV,机器模型测试的ESD容限为700V。另外,在室温下实现了高于660 MHz的DRAM数据速率。结果表明,与传统结构相比,ESD和I / O电容均得到了显着改善。

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