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Compact Modeling of High-Voltage LDMOS Devices Including Quasi-Saturation

机译:包括准饱和在内的高压LDMOS器件的紧凑建模

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The surface-potential-based compact transistor model, MOS Model 20 (MM20), has been extended with a quasi-saturation, an effect that is typical for LDMOS devices with a long drift region. As a result, MM20 extends its application range from low-voltage LDMOS devices up to high-voltage LDMOS devices of about 100 V. In this paper, the new dc model of MM20, including quasi-saturation, is presented. The addition of velocity saturation in the drift region ensures the current to be controlled by either the channel region or the drift region. A comparison with dc measurements on a 60-V LDMOS device shows that the new model provides an accurate description in all regimes of operation, ranging from subthreshold to superthreshold, in both the linear and saturation regime. Thus, owing to the inclusion of quasi-saturation also the regime of high-gate and high-drain bias conditions for high-voltage LDMOS devices is accurately described.
机译:基于表面电势的紧凑型晶体管模型MOS模型20(MM20)已扩展为具有准饱和度,这对于漂移区较长的LDMOS器件来说是典型的效果。结果,MM20将其应用范围从低压LDMOS器件扩展到大约100 V的高压LDMOS器件。在本文中,提出了包括准饱和的MM20新的直流模型。漂移区中速度饱和的增加确保了电流可以通过沟道区或漂移区来控制。与60V LDMOS器件上的直流测量结果进行比较,结果表明,新模型在线性和饱和状态下的所有工作状态下(从亚阈值到超阈值)都提供了准确的描述。因此,由于包含了准饱和,因此也准确地描述了高压LDMOS器件的高栅极和高漏极偏置条件的状态。

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