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OCVD Lifetime Measurements on 4H-SiC Bipolar Planar Diodes: Dependences on Carrier Injection and Diode Area

机译:在4H-SiC双极平面二极管上进行OCVD寿命测量:取决于载流子注入和二极管面积

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摘要

In this paper, open-circuit voltage decay measurements of carrier lifetimes on 4H silicon carbide ion implanted planar p–i–n diodes of circular shape and different diameters are performed at increasing bias currents. The measured ambipolar carrier lifetimes have shown to be dependent on the carrier injection levels, quickly increasing at low-bias current up to reaching a saturation value, tau _{text {HL}} , when the value of the average carrier density within the base exceeds the intrinsic-region doping. The tau _{text {HL}} measured in diodes of different area also demonstrate a marked dependence on the diode dimension, with longer lifetimes being typical of larger-diameter diodes, suggesting that a great contribution of recombination comes from the diode periphery. A bulk ambipolar lifetime tau _{text {HL$_{}$Vol}} = {320} ns has been extracted from the area-dependent measured lifetimes.
机译:在本文中,在增加偏置电流的情况下,对圆形和不同直径的4H碳化硅离子注入平面p–i–n二极管的载流子寿命进行开路电压衰减测量。测得的双极性载流子寿命取决于载流子注入水平,当在基极内平均载流子密度的值时,在低偏置电流下迅速增加直至达到饱和值tau _ {text {HL}}。超过了本征区掺杂。在不同面积的二极管中测得的tau_ {text {HL}}也显示出对二极管尺寸的显着依赖性,较长直径的寿命是较大直径二极管的典型特征,这表明重组的很大贡献来自二极管外围。已从与面积相关的实测寿命中提取了整体双极性寿命tau_ {text {HL $ _ {} $ Vol}} = {320} ns。

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