机译:在4H-SiC双极平面二极管上进行OCVD寿命测量:取决于载流子注入和二极管面积
Department of Engineering and Architecture, Università di Parma, Parma, Italy;
Department of Engineering and Architecture, Università di Parma, Parma, Italy;
Department of Engineering and Architecture, Università di Parma, Parma, Italy;
CNR-IMM of Bologna, Bologna, Italy;
Current measurement; P-i-n diodes; Voltage measurement; Charge carrier lifetime; Silicon carbide; Resistance; Surface treatment;
机译:Al〜+离子注入的4H-SiC垂直p〜+ -i-n二极管:漏电流和OCVD载流子寿命的处理依赖性
机译:SIC功率MOSFET体二极管的OCVD载波寿命与温度测量与反向恢复行为的相关性
机译:具有轴向载流子寿命梯度的P〜+ NN〜+二极管结构中的OCVD载流子寿命
机译:使用OCVD技术测量3.3kV 4H-SiC PiN二极管中载流子寿命的温度依赖性
机译:可变寿命P-I-N二极管的物理模型和绝缘栅双极晶体管(IGBT)的二维效应
机译:非极性m面InGaN / GaN发光二极管的有效载流子注入传输弛豫和复合与更强的载流子定位和低极化效应相关
机译:用OCVD技术测量3.3kV 4H-siC piN二极管载流子寿命温度的依赖性