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A Novel IGBT With High- k Dielectric Modulation Achieving Ultralow Turn-Off Loss

机译:具有高k介电调制的新型IGBT实现超级关闭损耗

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A novel insulated gate bipolar transistor modulated by a high-k dielectric (HK-IGBT) is presented. By laterally alternating the HK-pillar and N-drift, HK-IGBT can offer a quick and complete depletion to the drift region during the turn-off transient. This merit greatly reduces the current varying time of an HK-IGBT. Moreover, HK-IGBT can obtain a better electric field distribution, which enables the carrier stored layer (CSL) to have a higher doping dose when compared to a typical carrier stored trench gate bipolar transistor (CSTBT). These advantages improve the relationship between the static and transient power losses. According to the simulation results, HK-IGBT obtains a 66% lower turn-off loss than that of a field stop (FS) IGBT with the same ON-state voltage. Moreover, by using a CSL, the performance of an HK-IGBT can be comparable with that of a super-junction IGBT (SJ-IGBT).
机译:呈现由高k电介质(HK-IGBT)调制的新型绝缘栅双极晶体管。通过横向交替HK-Pillar和N漂移,HK-IGBT可以在关闭瞬态期间向漂移区域提供快速和完全的耗尽。这一优点大大降低了HK-IGBT的当前变化时间。此外,HK-IGBT可以获得更好的电场分布,其使得与典型载流沟槽栅极双极晶体管(CSTBT)相比,载体存储的层(CSL)能够具有较高的掺杂剂量。这些优点提高了静态和瞬态功率损耗之间的关系。根据仿真结果,HK-IGBT比现场停止(FS)IGBT的开关损耗降低66%,具有相同的导通电压。此外,通过使用CSL,HK-IGBT的性能可以与超结IGBT(SJ-IGBT)的性能相当。

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