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Contact Resistance of Microbumps in a Typical Through-Silicon-Via Structure

机译:典型的硅通孔结构中微凸点的接触电阻

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摘要

The contact resistance of microbumps in a plastic ball grid array packaging with a through-silicon-via (TSV) structure was characterized. Accordingly, a self-designed TSV daisy-chain circuit was proposed to facilitate the formulation of the measurement paths, and the test samples were made by using a commercialized packaging process to simulate real product behaviors. Using the proposed single model and the complete model for the testing structure, about 25 mQ was measured as the average contact resistance per microbump, and the contact resistance for each microbump was separately extracted between 4 and 60 mQ In addition, decreasing contact resistance due to the annealing effect was observed from two different reliability tests.
机译:表征了具有贯通硅通孔(TSV)结构的塑料球栅阵列包装中微凸点的接触电阻。因此,提出了一种自行设计的TSV菊花链电路,以方便制定测量路径,并通过使用商业化包装工艺来模拟实际产品行为来制作测试样品。使用建议的单一模型和测试结构的完整模型,大约25 mQ被测量为每个微凸点的平均接触电阻,并且每个微凸点的接触电阻被分别提取​​为4到60 mQ之间。从两个不同的可靠性测试中观察到了退火效果。

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