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Corrections to “Growth of Lanthanum Manganate Buffer Layers for Coated Conductors via a Metal–Organic Decomposition Process”

机译:对“通过金属有机分解工艺生长用于涂层导体的锰酸镧缓冲层”的更正

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摘要

In our prior paper, we reported forming (110)-oriented LaMnO$_3$ on a biaxially textured Ni-3at%W substrate. Chemical analysis of these films subsequent to publishing the paper showed only La and O—there was no Mn present in the film. The film was actually (400)-oriented La$_2$O$_3$ with the cubic bixbyite structure. Subsequent studies also showed that MnO film is not stable on Ni and Ni–W substrate surfaces at 1100 $^{circ}$C and $hbox{P}_{{rm O}2} = 10^{-16}$ atm where bulk MnO is stable.
机译:在我们以前的论文中,我们报道了在双轴织构的Ni-3at%W衬底上形成(110)取向的LaMnO $ _3 $。发表论文后,对这些薄膜的化学分析显示,只有La和O-薄膜中没有Mn。该膜实际上是(400)取向的La $ _2 $ O $ _3 $,具有立方方铁矿结构。随后的研究还表明,MnO膜在1100 $ ^ {circ} $ C和$ hbox {P} _ {{rm O} 2} = 10 ^ {-16} $ atm的Ni和Ni-W衬底表面上不稳定。 MnO稳定的地方。

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