Electro -deposition technique (ED) is a simplify and low cost technique which is easy to realize the reel - to -reel preparation of YBa2Cu3O7-δ coated conductor buffer layers. In the present work, CeO2 buffer layers were epitaxially grown on (00l) Ni - 5W biaxially textured substrates using electro - deposition technique. The texture and surface topography of buffer films were characterized by X -ray diffraction (XRD), pole figure, scanning electron microscope (SEM) and atomic force microscope (AFM). The CeO2 buffer layers show well bi - axial texture and low surface roughness with FHWM value and RMS a-bout 5. 2°and 2 ran, respectively, a improvement compare to Ni -5W substrates, which is suitable for subsequent buffer layers and YBCO films epitaxial grown.%电化学沉积法制备高温超导YBa2 Cu3O7-δ涂层导体缓冲层具有工艺简单、设备要求低、易于连续化批量制备等优点.采用电化学沉积法,在双轴织构的Ni-5at.％W(Ni-5W)金属基带上成功制备出了具有良好c轴取向的CeO2缓冲层薄膜.利用X射线衍射、极图、扫描电子显微镜和原子力显微镜等对上述氧化物薄膜的织构、表面形貌等进行表征.重点研究了薄膜厚度、退火温度、退火时间等工艺对薄膜外延生长及其表面形貌的影响,结果表明:电化学沉积方法制备的CeO2缓冲层具有很好的双轴织构、表面平整、均一,粗糙度低,表现出良好的缓冲层性质.结合金属有机化学溶液超导层的制备技术,本工作展示了一条全化学法制备第二代高温超导带材的技术路线,具有很好的应用前景.
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