Reversible Nanopatterning on Polypyrrole Films by Atomic Force Microscope Electrochemical Lithography

摘要

A reversible, erasable, and rewritable pattern at the nanoscale is inscribed on polypyrrole films doped with sodium dodecylbenzenesulfonate (PPy(DBS)) utilizing atomic force microscopy based electrochemical lithography. Nanopatterns are formed by applying a bias voltage between a conductive tip and the substrate. Afterward, the generated nanopatterns can be erased completely, followed by rewriting at the same location of the polymer film. Moreover, the alterations of PPy(DBS) during the lithography process are investigated by comparing the changes of the current intensity and surface potential depending on the lithography time.