PZT厚膜的电射流沉积研究

摘要

Electrohydrodynamic jet deposition ( EJD ) technology combined with Pb-based lanthanum-doped zirconate titanates( PZT)composite slurry is used to deposit PZT thick films on Si substrate. The effect of EJD working distance,flow rate and slurry mixing condition on compactness of PZT thick films are examined. The results show that the reduction of working distance and flow rate can help to increase a density of PZT thick film;mix PZT composite slurry using ball-milling method can significantly improve compactness of the deposited thick films. By using optimum EJD parameters and slurry ball-milling time of 20 h,crack-free PZT thick films with a thickness of 10μm is deposited,it exhibits a relative permittivity of 255 and d33 of 67 pC·N-1 .%制备了锆钛酸铅( PZT)悬浮液,采用电射流沉积( EJD)技术,在硅衬底上沉积了PZT厚膜.研究了电射流沉积高度、流量及悬浮液混合条件对厚膜致密性的影响.结果表明:降低电射流沉积高度和流量有助于提高沉积PZT厚膜致密性;采用球磨方法充分混合PZT悬浮液,沉积的PZT厚膜致密性明显提高.采用优化的电射流沉积参数和球磨20 h的PZT悬浮液,制备了10μm无裂纹PZT厚膜,其压电常数d33为67 pC·N-1 ,相对介电常数εr 为255.