METHOD FOR PRODUCING RAW MATERIAL SOLUTION FOR FORMING PZT FILM BY CHEMICAL VAPOR DEPOSITION METHOD AND PZT FILM-FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method for easily producing a raw material solution of high purity (n-butoxy)tris(pivaloylmethanato)zirconium for using in the vaporized solution source of chemical vapor deposition method, and a PZT film-forming method using the solution.;SOLUTION: The (isopropoxy)tris(dipivaloylmethanato)zirconium is synthesized with the use of purified zirconium isopropoxide as a raw material, and then the (isopropoxy)tris(dipivaloylmethanato)zirconium is dissolved in n-butyl acetate, and thereafter left to stand at room temperature for 5 or more hours to obtain a raw material solution of completely converted (n-butoxy)tris(dipivaloylmethanato)zirconium.;COPYRIGHT: (C)2006,JPO&NCIPI