浅析磁控溅射部分氧化镍铬膜工艺

摘要

In this article various steady production ways of nickel chromium partial oxidation film was described for various conditions, such as different gas-flow rate and different sputtering power.%通过对磁控溅射部分氧化镍铬膜工艺的研究,指出在不同工艺气体流量下,在不同溅射功率下,如何稳定控制部分氧化镍铬膜的生产。