首页> 外文期刊>Diamond and Related Materials >Boron carbide films deposited by a magnetron sputter-ion plating process: film composition and tribological properties
【24h】

Boron carbide films deposited by a magnetron sputter-ion plating process: film composition and tribological properties

机译:通过磁控溅射离子镀工艺沉积的碳化硼膜:膜组成和摩擦学性能

获取原文
获取原文并翻译 | 示例
           

摘要

Amorphous boron carbide films were deposited onto silicon substrates by a magnetron sputter ion plating process in an argon plasma atmosphere (0.25 Pa) using a B{sub}4C target. The substrates were polarized with a d.c. bias voltage in the range from 0 to -100 V. The film composition and the presence of contaminants were determined by ion beam analysis (IBA). The nanoscale tribological properties were investigated by atomic force microscopy (AFM). IBA revealed that the boron carbon atomic ratio is around 4 and that oxygen contamination does not exceed 10 at.%. The hydrogen content is below 2 at.%. The film density is nearly the bulk value for all biases applied to the substrate. AFM measurements show that the surface roughness decreases with increase of bias from 0.85 to 0.15 nm. The friction coefficient obtained by lateral force measurements follows the same trend, decreasing with increasing bias from 0.25 to 0.1. Wear measurements were performed and the wear depth decreased for films with lower friction coefficients. A mechanism based on the removal of a modified B{sub}4C surface layer is proposed to explain the wear results.
机译:使用B {sub} 4C靶,在氩等离子体气氛(0.25 Pa)中,通过磁控溅射离子镀工艺将非晶碳化硼膜沉积在硅基板上。用直流电将衬底极化。偏压范围为0至-100V。通过离子束分析(IBA)确定膜的组成和污染物的存在。通过原子力显微镜(AFM)研究了纳米级的摩擦学性能。 IBA透露硼碳原子比约为4,氧污染不超过10 at。%。氢含量低于2原子%。对于施加到基板上的所有偏压,膜密度几乎是体积值。原子力显微镜的测量表明,表面粗糙度随着偏压从0.85到0.15 nm的增加而减小。通过侧向力测量获得的摩擦系数遵循相同的趋势,随着偏置从0.25增加到0.1而减小。对具有较低摩擦系数的薄膜进行了磨损测量,磨损深度减小了。提出了一种基于去除改性B {sub} 4C表面层的机理来解释磨损结果的方法。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号