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PROPERTIES OF TAWN AND TAN/TAWN COATING FILM DEPOSITED ON WC-CO-BASED CEMENTED CARBIDE USING MAGNETRON SPUTTER ION PLATING

机译：使用磁控溅射离子电镀沉积在WC-Co-Co-Co-Celed碳化物上的棉絮和TAN /棉絮膜的性质

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Tadahiro Wada;
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1. Boron carbide films deposited by a magnetron sputter-ion plating process: film composition and tribological properties [J] . D. C. Reigada, R. Prioli, L. G. Jacobsohn, Diamond and Related Materials . 2000,第3a6期

机译：通过磁控溅射离子镀工艺沉积的碳化硼膜：膜组成和摩擦学性能
2. Boron carbide films deposited by magnetron sputter- ion plating process: film composition and tribological properties [J] . D.C.Reigada, R.Prioli Diamond and Related Materials . 2000,第3a6期

机译：通过磁控溅射-离子镀工艺沉积的碳化硼膜：膜组成和摩擦学性能
3. Coating characteristics and tribological properties of sputter-deposited MoS{sub}2/metal composite coatings deposited by closed field unbalanced magnetron sputter ion plating [J] . N. M. Renevier, V. C. Fox, D. G. Teer, Surface & Coatings Technology . 2000,第1期

机译：封闭场不平衡磁控溅射离子镀制备的溅射沉积MoS {sub} 2 /金属复合涂层的涂层特性和摩擦学性能
4. Properties of TaN Coating Film Deposited on WC-Co-based Cemented Carbide using Magnetron Sputter Ion Plating [C] . Tadahiro Wada, Koji Iwamoto, Keizo Tsukamoto, International Conference on Applied Mechanics and Manufacturing Technology . 2011

机译：使用磁控溅射离子电镀沉积在WC-Co-Co-Co-Coled碳化物上的Tan涂膜的性质
5. Structure, mechanical, tribological properties, and high temperature stability of titanium diboride/titanium carbide and titanium oxide/aluminum oxide multilayer coatings synthesized by magnetron sputtering. [D] . Lee, Kitty W. 2004

机译：通过磁控溅射合成的二硼化钛/碳化钛和氧化钛/氧化铝多层涂层的结构，机械，摩擦学性能和高温稳定性。
6. Thermoelectric Characteristics of Silicon Carbide and Tungsten-Rhenium-Based Thin-Film Thermocouples Sensor with Protective Coating Layer by RF Magnetron Sputtering [O] . Zhongkai Zhang, Bian Tian, Yan Liu, 2019

机译：射频磁控溅射碳化硅和钨hen基薄膜热电偶保护涂层的热电特性
7. Properties of TaN Coating Film Deposited on WC-Co-based Cemented Carbide using Magnetron Sputter Ion Plating [O] . Tadahiro Wada, Koji Iwamoto, Keizo Tsukamoto, 2015

机译：用磁控溅射离子镀在WC-Co基硬质合金上沉积TaN涂层膜的性能

PROPERTIES OF TAWN AND TAN/TAWN COATING FILM DEPOSITED ON WC-CO-BASED CEMENTED CARBIDE USING MAGNETRON SPUTTER ION PLATING

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