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Controlling (In,Ga)As quantum structures on high index GaAs surfaces

机译:控制高折射率GaAs表面上的(In,Ga)As量子结构

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We investigate the formation of (In,Ga)As self assembled quantum structures grown on different orientations of a GaAs substrate along one side of the stereographic triangle between (100) and (111)A surfaces. The samples were grown by Molecular Beam Epitaxy, monitored by Reflection High-Energy Electron Diffraction during the growth and characterized by in-situ Scanning Tunneling Microscopy and Atomic Force Microscopy. A systematic transition from zero dimensional (In,Ga)As quantum dots to one dimensional quantum wires was observed as the substrate was varied along the side of the triangle within 25° miscut from the (100) toward (111)A, which includes several high index surfaces. We propose an explanation for the role of the substrate in determining the type of the nanostructure that is formed.
机译:我们研究(In,Ga)As自组装量子结构的形成,这些结构沿(100)和(111)A表面之间的立体三角形的一侧在GaAs衬底的不同方向上生长。样品通过分子束外延生长,在生长过程中通过反射高能电子衍射进行监测,并通过原位扫描隧道显微镜和原子力显微镜进行表征。观察到从零维(In,Ga)As量子点到一维量子线的系统过渡,因为基板沿三角形的侧面在从(100)向(111)A错切25°的范围内变化,其中包括多个高折射率表面。我们提出了对基板在确定所形成的纳米结构类型中的作用的解释。

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