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Investigation of pre-structured GaAs surfaces for subsequent site-selective InAs quantum dot growth

机译:预构造GaAs表面用于随后的位置选择性InAs量子点生长的研究

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摘要

In this study, we investigated pre-structured (100) GaAs sample surfaces with respect to subsequent site-selective quantum dot growth. Defects occurring in the GaAs buffer layer grown after pre-structuring are attributed to insufficient cleaning of the samples prior to regrowth. Successive cleaning steps were analyzed and optimized. A UV-ozone cleaning is performed at the end of sample preparation in order to get rid of remaining organic contamination.
机译:在这项研究中,我们调查了预构造的(100)GaAs样品表面相对于后续的位点选择性量子点生长的情况。在预结构化之后生长的GaAs缓冲层中发生的缺陷归因于在再生之前未充分清洁样品。对连续的清洁步骤进行了分析和优化。在样品制备结束时进行紫外线臭氧清洁,以去除残留的有机污染物。

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