首页> 外文会议>Conference on Device and Process Technologies for Microelectronics, MEMS, and Photonics >The investigations of InAs quantum dots overgrown on In_(0.1)Ga_(0.9)As surfactant layer and 10° off-angle (100) GaAs substrate
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The investigations of InAs quantum dots overgrown on In_(0.1)Ga_(0.9)As surfactant layer and 10° off-angle (100) GaAs substrate

机译:INAS量子点对IN_(0.1)GA_(0.9)的INAS量子点作为表面活性剂层和10°偏角(100)GaAs衬底的研究

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For propose of achieving the high coherent quantum dots or the expected spectral emission, we have proposed the epitaxial method solved by using self-organized grown on the In_xGa_(1-x)As relaxed layer and the mis-orientated GaAs substrates. In this study, using extra slow growth rate of 0.075ML/sec to grow the quantum dot matrix under the temperature of 500°C by the general Riber 32P solid-source MBE system, the high surface density and uniformity in size of two-stacked of quantum dot (QD) matrix have been established. The temperature dependences of the full widths at half-maximum (FWHM) and the positions of photoluminescence (PL) bands are studied experimentally by adding In_(0.1)Ga_(0.9)As surfactant layer and using mis-orientated substrate, respectively. The 3-dimensional QD images using atomic force microscopy (AFM) well agree with the results of above mentioned. Therefore, a systematic estimate is given of the QD structures grown on different epitaxial conditions.
机译:为了提出实现高相干量子点或预期的光谱发射,我们提出了通过在in_xga_(1-x)上的自组织生长作为松弛层和错误定向的GaAs基材来解决的外延方法。在本研究中,使用额外的慢速生长速率为0.075ml / sec,通过雷伯32p固体源Mbe系统的温度,高度刚度的温度,高表面密度和均匀性的两堆叠已经建立了量子点(QD)矩阵。通过将In_(0.1)Ga_(0.9)作为表面活性剂层和使用错误取向的衬底,通过基本上研究半最大(FWHM)和光致发光(PL)带的位置和光致发光(PL)带的位置的温度依赖性。使用原子力显微镜(AFM)的三维QD图像与上述结果同意。因此,给出了在不同外延条件下生长的QD结构的系统估计。

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