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Investigation of the InAs/GaAs Quantum Dots’ Size: Dependence on the Strain Reducing Layer’s Position

机译:InAs / GaAs量子点尺寸研究:取决于应变减小层的位置

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摘要

This work reports on theoretical and experimental investigation of the impact of InAs quantum dots (QDs) position with respect to InGaAs strain reducing layer (SRL). The investigated samples are grown by molecular beam epitaxy and characterized by photoluminescence spectroscopy (PL). The QDs optical transition energies have been calculated by solving the three dimensional Schrödinger equation using the finite element methods and taking into account the strain induced by the lattice mismatch. We have considered a lens shaped InAs QDs in a pure GaAs matrix and either with InGaAs strain reducing cap layer or underlying layer. The correlation between numerical calculation and PL measurements allowed us to track the mean buried QDs size evolution with respect to the surrounding matrix composition. The simulations reveal that the buried QDs’ realistic size is less than that experimentally driven from atomic force microscopy observation. Furthermore, the average size is found to be slightly increased for InGaAs capped QDs and dramatically decreased for QDs with InGaAs under layer.
机译:这项工作报告有关InAs量子点(QDs)位置相对于InGaAs应变降低层(SRL)的影响的理论和实验研究。所研究的样品通过分子束外延生长,并通过光致发光光谱法(PL)进行表征。通过使用有限元方法求解三维Schrödinger方程并考虑晶格失配引起的应变,可以计算出QD的光学跃迁能。我们已经考虑了在纯GaAs矩阵中并具有InGaAs应变降低帽层或下层的透镜状InAs QD。数值计算和PL测量之间的相关性使我们能够跟踪相对于周围基质组成的平均掩埋QD尺寸演变。仿真结果表明,掩埋量子点的真实尺寸小于原子力显微镜观察实验得出的尺寸。此外,发现对InGaAs封盖的QD的平均尺寸略有增加,而在InGaAs底层的QD的平均尺寸则明显减小。

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