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Nanostructures and Crystal Defects in Thick GaN and SiC Epitaxial Layers for Power Electronic Switches

机译:厚GaN中的纳米结构和晶体缺陷,用于电力电子开关的SIC外延层

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The state-of-the-art power switching devices made from SiC and GaN semiconductors contain a high density of crystal defects. Most of these defects are present in starting wafers and some are generated during device processing. There is little conclusive evidence so far on the exact role that the crystal defects paly on device performance, manufacturing yield, and more importantly, long-term field-reliability especially when devices are operating under extreme stressful environments. This paper provides a review of the current state-of-the-art of SiC and GaN power semiconductor material technology, and the potential impact crystal defects may have on high-density power switching electronics. A review of silicon technology development and manufacturing evolution is made to draw a parallel between silicon and wide bandgap (WBG) semiconductor power electronics.
机译:由SiC和GaN半导体制成的最先进的电力开关装置包含高密度的晶体缺陷。大多数这些缺陷都存在于起始晶片中,并且在设备处理期间产生一些。迄今为止,晶体缺陷在设备性能,制造产量和更重要的是,长期现场可靠性的确切作用很少,特别是当设备在极端压力环境下运行时。本文提供了对目前的SIC和GaN功率半导体材料技术的审查,并且潜在的冲击晶体缺陷可能对高密度电源开关电子器件具有。对硅技术开发和制造演化的综述绘制硅和宽带隙(WBG)半导体电力电子之间的平行。

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