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Stress intensity factors of delamination interface in IC packages subject to non-steady thermal stress

机译:IC封装中分层界面的应力强度因子受到非稳定热应力的影响

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Interface delamination in IC Packages is a critical issue in both structural design and material selection of plastic IC packages. The 2-D finite element analysis was carried out to estimate the stress-intensity factor of delamination interface in IC packages subject to non-steady thermal stress. The stress-intensity factor K associated with a thermal interface crack was discussed from three different approaches: virtual crack extension method, modified crack closure integral and displacement extrapolation. An accuracy of stress intensity factors obtained by finite element analysis was discussed by comparison of results by different approaches.
机译:IC包中的接口分层是塑料IC封装的结构设计和材料选择中的一个关键问题。进行了2-D有限元分析,以估计通过非稳定的热应力的IC封装中分层界面的应力强度因子。从三种不同的方法讨论了与热界面裂纹相关联的应力强度因子k:虚拟裂缝延伸方法,改进的裂纹闭合整体和位移外推。通过通过不同方法的结果进行比较讨论了通过有限元分析获得的应力强度因子的准确性。

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