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INFLUENCE OF ELECTRON IRRADIATION AND POSTANNEALING ON PHOTOLUMINESCENCE OF GaInNAs/GaAs Quantum Wells

机译:电子辐照对增益/ GaAs量子阱光致发光的影响

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We investigated the effects of 7-MeV electron irradiation (2×10{sup}13 and 2×10{sup}13 cm{sup}(-2) doses) and postannealing on photoluminescence (PL) from 1.3-μm GaInNAs/GaAs multiple quantum wells (QWs) grown by molecular-beam epitaxy. A small enhancement (27%) in PL intensity is found for the lower dose whereas a noticeable deterioration in PL intensity is seen for the higher dose. When annealed at 650°Cfor 1 min the sample irradiated to the dose of 2×10{sup}13 cm{sup}(-2) underwent a similar enhancement and blue-shift in PL as the non-irradiated sample. In contrast, a much strong PL is observed for the sample irradiated to the dose of 2×10{sup}16 cm{sup}(-2) as compared to the non-irradiated sample. This irradiation-promoted enhancement in PL is accompanied by a small additional blue-shift as well as by small changes in x-ray diffraction rocking curves, which indicate small changes in quantum-well alloy composition or structure.
机译:我们调查了7-MeV电子照射(2×10 {Sup} 13和2×10 {Sup} 13cm {sup}( - 2)剂量的影响,从1.3μm增益/ GaAs上的光致发光(PL)上的猝灭分子束外延生长多量子阱(QWS)。对于较低剂量,发现PL强度的小增强(27%),而较高剂量的PL强度的显着劣化。当在650°CFOR 1中退火1分钟时,将样品照射到2×10 {sup} 13cm {sup}(-2)的剂量,在PL中进行了类似的增强和蓝色偏移作为非照射样品。相反,与非照射样品相比,将辐射到2×10}(sup}(-2)的剂量照射的样品的样品观察到一个强大的PL。该PL的该辐照促进的增强伴随着小的额外蓝移,以及X射线衍射摇曲曲线的小变化,表示量子阱合金组合物或结构的少量变化。

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