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Preparation and Characterization of polycrystalline iodized mercury thick films for detector array

机译:用于探测器阵列的多晶碘化汞厚膜的制备与表征

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The polycrystalline mercuric iodide thick-film array was deposited by hot wall physical vapor deposition (HWPVD) method using an aluminum alloy mask. The pixel size of the 4×4 array is 5×5 mm~2, and pixel spacing is about 0.2mm. Comparative study of the quality of the films grown on different pixels (type A, B, C) was conducted by Atomic force microscopy (AFM), Scanning electron microscopy (SEM), X-ray diffraction (XRD), and Raman spectroscopy. The results showed that films of all types were all compactly formed by separated columnar monocrystallines with uniform orientation along c-direction and had similar crystalline structures, indicating that the thick films deposited on the substrate had a good uniformity as a whole, and of all the three different type samples, type A were of the relatively highest quality.
机译:使用铝合金掩模通过热壁物理气相沉积(HWPVD)方法沉积多晶碘化汞厚膜阵列。 4×4阵列的像素尺寸为5×5mm〜2,像素间距约为0.2mm。通过原子力显微镜(AFM),扫描电子显微镜(SEM),X射线衍射(XRD)和拉曼光谱法对在不同像素(A,B,C型)上生长的薄膜的质量进行了比较研究。结果表明,所有类型的薄膜均由沿c方向均匀取向且具有相似晶体结构的分离的柱状单晶致密地形成,这表明沉积在基板上的厚膜总体上具有良好的均匀性,并且所有三种不同类型的样品(A型)的质量相对最高。

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