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Preparation of polycrystalline CdZnTe thick film Schottky diode for ultraviolet detectors

机译:紫外探测器用多晶CdZnTe厚膜肖特基二极管的制备

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High resistivity (3 × 10 ~9 Ω cm) polycrystalline CdZnTe thick films with thickness of 25 μm-150 μm were grown on SnO _2: F-coated glass substrates by close-spaced sublimation method. The properties of polycrystalline CdZnTe films were studied by XRD, SEM and EDS, respectively. A CdZnTe film Schottky diode detector was also fabricated and investigated using current-voltage and capacitance-voltage methods. The photo-current density of the device was about 1508.69 nA/mm ~2 under light illumination (λ = 260 nm), at an applied negative voltage of 15 V. The results showed that polycrystalline CdZnTe thick film was suitable for application in ultraviolet detectors
机译:通过近距离升华法在SnO _2:F涂层玻璃基板上生长厚度为25μm-150μm的高电阻率(3×10〜9Ωcm)多晶CdZnTe厚膜。用XRD,SEM和EDS分别研究了CdZnTe多晶薄膜的性能。还制造了CdZnTe薄膜肖特基二极管检测器,并使用电流-电压和电容-电压方法进行了研究。在15 V的负电压下,在光照(λ= 260 nm)下,该器件的光电流密度约为1508.69 nA / mm〜2。结果表明,多晶CdZnTe厚膜适合用于紫外探测器。

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