Advanced materials for 193-nm resists

摘要

Acrylate monomers containing alicycylic side chains featuring a series of plar substituent groups were assumed to be model compounds. SOlubility parameters were calculated for the corresponding acrylate polymers. These arylate monomers were synthesized using a novel aerobic oxidation reaction employing N-hydroxyhptalimide (NHPI) as a catalyst, and then polymerized. These reactions were confirmed to be applicable for the mass-production of those compunds. The calculation results agreed with the hydrophilic parameters measured experimentally. Morevover, the relationship between the resist performance and the above-mentioned solubility parameter has been studied. As a result, a correlation between the resist performance and the calculated solubility parameter was observed. Finally, resolution of 0.13-micron patterns, based on the 1G DRAM design rule, could be successfully fabricated by optimizing the solubility parameter and the resist composition.