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Effects of SOI film thickness on high-performance microprocessor by 0.13 /spl mu/m Partially-Depleted SOI CMOS technology

机译:SOI膜厚度对0.13 / spl mu / m部分耗尽SOI CMOS技术的高性能微处理器的影响

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This paper describes how SOI film thickness affects performance and power consumption of a Partially-Depleted (PD) SOI microprocessor. System level speed/power performance will be compared directly between chips fabricated with different SOI film thickness. The performance improvement is also supported by device level and macro circuit level comparison. Yield issues associated with thinner SOI will also be addressed.
机译:本文介绍了SOI膜的厚度如何影响部分耗尽(PD)SOI微处理器的性能和功耗。将直接比较具有不同SOI膜厚度的芯片之间的系统级速度/功率性能。器件级别和宏电路级别的比较也支持性能的提高。与更薄的SOI相关的良率问题也将得到解决。

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