Central Research Institute of Electric Power Industry (CRIEPI), 2-6-1 Nagasaka, Yokosuka, Kanagawa 240-0196, Japan;
Central Research Institute of Electric Power Industry (CRIEPI), 2-6-1 Nagasaka, Yokosuka, Kanagawa 240-0196, Japan;
Central Research Institute of Electric Power Industry (CRIEPI), 2-6-1 Nagasaka, Yokosuka, Kanagawa 240-0196, Japan;
Central Research Institute of Electric Power Industry (CRIEPI), 2-6-1 Nagasaka, Yokosuka, Kanagawa 240-0196, Japan;
Central Research Institute of Electric Power Industry (CRIEPI), 2-6-1 Nagasaka, Yokosuka, Kanagawa 240-0196, Japan;
Central Research Institute of Electric Power Industry (CRIEPI), 2-6-1 Nagasaka, Yokosuka, Kanagawa 240-0196, Japan;
Central Research Institute of Electric Power Industry (CRIEPI), 2-6-1 Nagasaka, Yokosuka, Kanagawa 240-0196, Japan;
机译:HCl有助于双极器件的厚4H-SiC外延层的生长
机译:超高压双极器件的厚4H-SiC外延生长和缺陷减少
机译:超高压绝缘栅双极晶体管的多层多层4H-SiC的外延生长和表征
机译:基于高压双极器件厚的4H-SiC脱色的生长和表征
机译:超高压4H-SiC双向绝缘栅双极晶体管。
机译:4H-SiC GTO器件中异常的位错聚集引起的正向压降
机译:低压热壁化学气相沉积4H-siC外延层的同质外延生长及表征