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机译:超高压绝缘栅双极晶体管的多层多层4H-SiC的外延生长和表征
Central Research Institute of Electric Power Industry (CRIEPI), 2-6-1 Nagasaka, Yokosuka, Kanagawa 240-0196, Japan;
Power Engineering R&D Center, Kansai Electric Power Co., Inc., 3-11-20 Nakoji, Amagasaki, Hyogo 661-0974, Japan;
Power Engineering R&D Center, Kansai Electric Power Co., Inc., 3-11-20 Nakoji, Amagasaki, Hyogo 661-0974, Japan;
Power Engineering R&D Center, Kansai Electric Power Co., Inc., 3-11-20 Nakoji, Amagasaki, Hyogo 661-0974, Japan;
National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan;
National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan;
National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan;
Central Research Institute of Electric Power Industry (CRIEPI), 2-6-1 Nagasaka, Yokosuka, Kanagawa 240-0196, Japan;
机译:厚多层4H-SiC的外延生长,用于制造超高压C面n沟道IGBT
机译:4H-SiC高压沟槽绝缘栅双极型晶体管关断损耗分析模型的研究
机译:超高压p沟道IGBT的多层多层4H-SiC外延晶片的生长和特性
机译:高压4H-SIC绝缘栅双极晶体管(IGBT)和MOS门双极晶体管(MGT)的比较
机译:超高压4H-SiC双向绝缘栅双极晶体管。
机译:低关断损耗的4H-SiC沟槽绝缘栅双极晶体管的仿真研究
机译:4H-SiC(0001)外延层中向内生长的堆叠缺陷的表征及其对高压肖特基势垒二极管的影响