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Forward Voltage Drop Induced by an Abnormal Threading Dislocation Aggregation in 4H-SiC GTO Devices

机译:4H-SiC GTO器件中异常的位错聚集引起的正向压降

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摘要

An abnormal star-like defect was found on the failed SiC gate turn-off thyristor (GTO) devices after metal removal and KOH etching at 450 °C in this work. It is of extraordinary larger size of 210–580 µm, even much larger than the etch pit of a micropipe in 4H-SiC. In addition, the abnormal star-like defect, exhibiting the consistent orientation with the six-fold symmetry of silicon carbide, was found to consist of several penetrating dislocations with the help of a LEXT OLS4000 3D laser confocal microscope. These abnormal star-like etch pits can severely reduce the forward blocking characteristic of GTOs, while exerting insignificant influence on the forward current-voltage characteristics between anode and gate electrode of the 4H-SiC GTO devices. Interestingly, the relationship between forward voltage drop and dislocation density is affected by the abnormal star-like defect. A regular increase of forward voltage drop at 100 A/cm was observed with the increasing dislocation density, while this correlation disappears in the presence of an abnormal star-like defect.
机译:在这项工作中,在去除金属并在450°C下进行KOH蚀刻后,在失效的SiC栅极关断晶闸管(GTO)器件上发现了异常的星形缺陷。它的尺寸非常大,为210–580 µm,甚至比4H-SiC中微管的蚀刻坑还要大。此外,借助LEXT OLS4000 3D激光共聚焦显微镜,发现异常的星形缺陷(具有与碳化硅的六重对称性一致的取向)由多个穿透位错组成。这些异常的星形蚀刻坑会严重降低GTO的正向阻挡特性,同时对4H-SiC GTO器件的阳极和栅极之间的正向电流-电压特性影响不大。有趣的是,正向电压降与位错密度之间的关系受到异常星形缺陷的影响。随着位错密度的增加,观察到正向电压降在100 A / cm处有规律的增加,而在存在异常星形缺陷的情况下,这种相关性消失了。

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