首页> 外文会议>Conference on Device and Process Technologies for Microelectronics, MEMS, and Photonics; 20071205-07; Canberra(AU) >The investigations of InAs quantum dots overgrown on In_(0.1)Ga_(0.9)As surfactant layer and 10° off-angle (100) GaAs substrate
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The investigations of InAs quantum dots overgrown on In_(0.1)Ga_(0.9)As surfactant layer and 10° off-angle (100) GaAs substrate

机译:In_(0.1)Ga_(0.9)As表面活性剂层和10°斜角(100)GaAs衬底上过量生长的InAs量子点的研究

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For propose of achieving the high coherent quantum dots or the expected spectral emission, we have proposed the epitaxial method solved by using self-organized grown on the In_xGa_(1-x)As relaxed layer and the mis-orientated GaAs substrates. In this study, using extra slow growth rate of 0.075ML/sec to grow the quantum dot matrix under the temperature of 500℃ by the general Riber 32P solid-source MBE system, the high surface density and uniformity in size of two-stacked of quantum dot (QD) matrix have been established. The temperature dependences of the full widths at half-maximum (FWHM) and the positions of photoluminescence (PL) bands are studied experimentally by adding In_(0.1)Ga_(0.9)As surfactant layer and using mis-orientated substrate, respectively. The 3-dimensional QD images using atomic force microscopy (AFM) well agree with the results of above mentioned. Therefore, a systematic estimate is given of the QD structures grown on different epitaxial conditions.
机译:为了提出实现高相干量子点或预期的光谱发射的方案,我们提出了一种外延方法,该方法通过使用在In_xGa_(1-x)As弛豫层和取向不正确的GaAs衬底上生长的自组织生长来解决。在这项研究中,使用普通的Riber 32P固体源MBE系统,以0.075ML / sec的超慢生长速率在500℃的温度下生长量子点矩阵,具有高表面密度和两层堆叠的尺寸均匀性。量子点(QD)矩阵已建立。通过分别添加In_(0.1)Ga_(0.9)作为表面活性剂层并使用取向错误的基板,分别实验研究了半峰全宽(FWHM)和光致发光(PL)谱带的温度依赖性。使用原子力显微镜(AFM)的3D QD图像与上述结果完全吻合。因此,给出了在不同外延条件下生长的QD结构的系统估计。

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