The gas of the plasma etching device to gush and

摘要

PROBLEM TO BE SOLVED: To provide a gas spouting plate for a plasma etching apparatus that enables accurate etching by eliminating distortion between an electrode plate and a cooling member. SOLUTION: A gas spouting plate 4 for a plasma etching apparatus 1 is composed of an electrode plate 11 made of silicon carbide sintered body having a structure whish passes gas, and a cooling member 12 made of silicon carbide sintered body provided thereto.