METHOD OF MEASURING GAS INTRODUCING HOLE PROVIDED IN ELECTRODE FOR PLASMA ETCHING DEVICE ELECTRODE ELECTRODE REGENERATION METHOD REGENERATED ELECTRODE PLASMA ETCHING DEVICE AND GAS INTRODUCING HOLE STATE DISTRIBUTION DIAGRAM AND DISPLAY METHOD FOR SAME

摘要

A method of measuring a gas introduction hole provided in an electrode for a plasma etching apparatus with high accuracy and an electrode provided with a gas introduction hole with high precision. A method for measuring a gas introduction hole provided in an electrode for a plasma etching apparatus according to the present invention is a method for measuring a gas introduction hole provided in an electrode for a plasma etching apparatus so as to penetrate the substrate in the thickness direction, A step of obtaining a two-dimensional image of light transmitted through the gas introduction hole to the other surface side of the substrate, and a step of calculating a diameter of the gas introduction hole, a roughness of the inner wall surface, And a step of measuring at least one of a vertical degree and a vertical degree.