ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANKS HAVING ACTIVE RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE AND NOVEL COMPOUND

摘要

PROBLEM TO BE SOLVED: To provide an active ray-sensitive or radiation-sensitive resin composition that can form a pattern satisfying high resolving power, excellent pattern shape, small line edge roughness (LER), to provide an active ray-sensitive or radiation-sensitive film using the active ray-sensitive or radiation-sensitive resin composition, to provide a mask blanks having the film and to provide a pattern forming method, and especially, to provide an active ray-sensitive or radiation-sensitive resin composition that exhibits high resolving power in the formation of an ultrafine pattern by exposure using an electron beam or an extreme ultraviolet ray and to provide a mask blanks and a pattern forming method each using the active ray-sensitive or radiation-sensitive resin composition.SOLUTION: The active ray-sensitive or radiation-sensitive resin composition contains (A) an alkali-soluble resin and (C) a crosslinking agent represented by formula (1-0).