首页> 外国专利> Production method of n-type SiC single crystal, n-type SiC single crystal obtained thereby and application of same

Production method of n-type SiC single crystal, n-type SiC single crystal obtained thereby and application of same

机译:n型SiC单晶的制造方法,由此得到的n型SiC单晶及其应用

摘要

A method for producing n-type SiC single crystal, including: adding gallium and nitrogen, which is a donor element, for obtaining an n-type semiconductor during crystal growth of SiC single crystal, such that the amount of nitrogen as represented in atm unit is greater than the amount of gallium as represented in atm unit; an n-type SiC single crystal obtained according to this production method; and, a semiconductor device that includes the n-type SiC single crystal.
机译:一种用于制造n型SiC单晶的方法,包括:添加作为施主元素的镓和氮,以在SiC单晶的晶体生长期间获得n型半导体,使得氮的量以atm单位表示。大于以atm单位表示的镓量;根据该制造方法得到的n型SiC单晶。半导体器件,其包括n型SiC单晶。

著录项

  • 公开/公告号US9157171B2

    专利类型

  • 公开/公告日2015-10-13

    原文格式PDF

  • 申请/专利权人 AKINORI SEKI;YASUYUKI FUJIWARA;

    申请/专利号US201013201771

  • 发明设计人 AKINORI SEKI;YASUYUKI FUJIWARA;

    申请日2010-02-18

  • 分类号C30B15/04;C30B29/36;C30B15/02;H01L29/167;C30B15/00;C30B19/00;H01L21/02;H01L29/78;H01L29/872;H01L29/16;

  • 国家 US

  • 入库时间 2022-08-21 15:23:59

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