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Analog and short channel effects performance of Sub-100 nm graded channel fully depleted silicon on insulator (SOI)udud

机译:绝缘体上低于100 nm渐变沟道的全耗尽硅(SOI)的模拟和短沟道效应性能 ud ud

摘要

This paper presents the dependency of analog and Short Channel Effects (SCEs) performance of 75 nm channel length fully-depleted Silicon On Insulator (SOI) device on the applied Graded Channel (GC) design. The comparative analysis between standard SOI (STD SOI) devices at doped channel and equivalent threshold voltage, VTH with GC SOI device are examined on the basis of internal physical mechanisms. Device characterizations are performed using simulation based approached provided by ATLAS 2D. Results show superiority of GC performances over standard SOI devices in both analog and SCEs point of views.
机译:本文介绍了75 nm沟道长度的完全耗尽型绝缘体上硅(SOI)器件的模拟和短沟道效应(SCE)性能对所应用的渐变沟道(GC)设计的依赖性。基于内部物理机制,研究了标准SOI器件在掺杂通道和等效阈值电压VTH与GC SOI器件之间的比较分析。使用ATLAS 2D提供的基于仿真的方法进行设备表征。结果表明,从模拟和SCE角度来看,GC性能均优于标准SOI设备。

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    Jafar N.; Soin N.;

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