Epitaxial Growth of Single Crystal Diamond on Silicon

摘要

Much of the equipment needed for this research is ready for work to begin. Theoxyacetylene torch for diamond CVD is currently operating and available. Although another project is actively employing the spin etch system and the pulsed laser system for depositing high temperature superconductors, the spin etch system is available immediately and the laser system is available on demand in about a month. Work on the conversion of the plasma reactor to an ultraclean, hot filament CVD reactor has begun. The ultraclean system is designed and most of the parts are on order including a new chamber, resin purifiers, and new mass flow controllers. A future work schedule is included.