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首页> 外文期刊>Semiconductors >High-Speed Photodiodes for the Mid-Infrared Spectral Region 1.2-2.4 μm Based on GaSb/GaInAsSb/GaAlAsSb Heterostructures with a Transmission Band of 2-5 GHz
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High-Speed Photodiodes for the Mid-Infrared Spectral Region 1.2-2.4 μm Based on GaSb/GaInAsSb/GaAlAsSb Heterostructures with a Transmission Band of 2-5 GHz

机译:基于GaSb / GaInAsSb / GaAlAsSb异质结构,传输频带为2-5 GHz的中红外光谱区1.2-2.4μm的高速光电二极管

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摘要

High-speed p-i-n photodiodes for the spectral range of 1.2-2.4 μm are fabricated for the first time based on a GaAs/GaInAsSb/GaAlAsSb heterostructure with separated sensitive- (50 μm in diameter) and contact mesas, which are connected by a bridge front contact. The use of an unconventional design for the contact mesa with a Si_3N_4 insulating sublayer 0.3 μm thick under the metal contact made it possible to lower both the intrinsic photodiode capacitance and the reverse dark currents. The photodiodes have a low intrinsic capacitance of 3-5 pF at zero bias and 0.8-1.5 pF at a reverse bias of 3.0 V. The photodiode operating speed, which is determined by the time of increasing the photoresponse pulse to a level of 0.1-0.9, is 50-100 ps. The transmission band of the photodiodes reaches 2-5 GHz. The photodiodes are characterized by low reverse dark currents I_d = 200-1500 nA with a reverse bias of U = -(0.5-3.0) V, a high current monochromatic sensitivity of R_i = 1.10-1.15 A/W, and a detectability of D~*(λ_(max), 1000, 1) = 0.9 × 10~(11) W~(-1) cm Hz~(1/2) at wavelengths of 2.0-2.2 μm.
机译:首次基于GaAs / GaInAsSb / GaAlAsSb异质结构制造了光谱范围为1.2-2.4μm的高速pin光电二极管,该异质结构具有分离的灵敏(直径为50μm)和接触台面,并通过桥前连接联系。通过在金属触点下方使用厚度为0.3μm的Si_3N_4绝缘子层的接触台面采用非常规设计,可以降低固有光电二极管电容和反向暗电流。光电二极管在零偏压下具有3-5 pF的低本征电容,而在3.0 V的反向偏压下具有0.8-1.5 pF的低本征电容。光电二极管的工作速度取决于将光响应脉冲增加到0.1-F的时间。 0.9,是50-100 ps。光电二极管的传输频带达到2-5 GHz。光电二极管的特点是低反向暗电流I_d = 200-1500 nA,反向偏置U =-(0.5-3.0)V,高电流单色灵敏度R_i = 1.10-1.15 A / W,可检测性D 〜*(λ_(max),1000,1)= 0.9×10〜(11)W〜(-1)cm Hz〜(1/2),波长为2.0-2.2μm。

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