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Mapping Analysis of Single Crystal SiC Polytypes Grown From Purified β-SiC Powder

机译:纯化的β-SiC粉末生长的单晶SiC多晶型图分析

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摘要

The most important consideration when growing single crystal silicon carbide by the physical vapor transport method is to minimize defects. To minimize defects caused by temperature gradient, we used β phase SiC powder, which has a low sublimation temperature, and purified the β phase SiC powder to improve the purity of single crystal SiC. Furthermore, we performed thermodynamic computational simulations based on compositions of purified and non-purified β-SiC powders to study the impact of metallic impurities within SiC powder on the composition of single crystal SiC. We grew SiC at temperatures about 200 °C lower than the previous growth temperature using purified β-SiC powder and mapped the phase change behavior of SiC according to different growth temperatures. Moreover, we compared and analyzed the characteristics of SiC polytype formation and crystallinity according to growth temperature. We compared the distribution of defects and dislocations of single crystal 4H SiC grown from purified and non-purified β-SiC powder to study the impact of source purification on defect generation. We also investigated the effect of metallic impurities on the formation of defects and dislocations through content analysis of metallic impurities.
机译:通过物理气相传输方法生长单晶碳化硅时,最重要的考虑因素是使缺陷最小化。为了使温度梯度引起的缺陷最小化,我们使用了升华温度低的β相SiC粉末,并对β相SiC粉末进行了提纯以提高单晶SiC的纯度。此外,我们基于纯化和未纯化的β-SiC粉末的成分进行了热力学计算模拟,以研究SiC粉末中金属杂质对单晶SiC成分的影响。我们使用纯化的β-SiC粉末在比以前的生长温度低约200°C的温度下生长SiC,并根据不同的生长温度绘制了SiC的相变行为。此外,我们根据生长温度对SiC多晶型的形成和结晶性进行了比较和分析。我们比较了从纯化和未纯化的β-SiC粉末生长的单晶4H SiC的缺陷分布和位错,以研究源极纯化对缺陷产生的影响。我们还通过金属杂质的含量分析研究了金属杂质对缺陷和位错形成的影响。

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