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Polytype Control by Pretreatment of SiC Source Powder for 4H-SiC Single Crystal Growth

机译:通过对4H-SiC单晶生长的SiC源粉进行预处理的聚型控制

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4H-SiC single crystal was successfully grown with source powder modified by the pretreatment process in order to improve polytype stability of SiC crystal. To increase C/Si ratio in SiC source powder, SiC source powder was mixed with liquid carbon source and then pre-heated at 1200°C. SiC single crystal grown with modified source powder exhibited complete 4H polytype. The rocking curve value and defect density of SiC crystal grown with modified source powder was observed to be smaller than those of SiC crystal with conventional powder.
机译:通过预处理过程改变的源粉成功生长了4H-SiC单晶,以改善SiC晶体的多型稳定性。 为了增加SiC源粉末中的C / Si比,将SiC光源粉末与液体碳源混合,然后在1200℃下预热。 使用改性源粉生长的SiC单晶显示出完整的4H多型。 观察到用改性源粉末生长的SiC晶体的摇摆曲线值和缺陷密度小于具有常规粉末的SiC晶体的SiC晶体。

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