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首页> 外文期刊>Integrated Ferroelectrics >STUDY OF ACOUSTICAL AND OPTICAL PROPERTIES OF AIN FILMS FOR SAW AND BAW DEVICES: CORRELATION BETWEEN THESE PROPERTIES
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STUDY OF ACOUSTICAL AND OPTICAL PROPERTIES OF AIN FILMS FOR SAW AND BAW DEVICES: CORRELATION BETWEEN THESE PROPERTIES

机译:锯和爪器件主要膜的声光特性研究:这些特性之间的相关性

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摘要

Polycrystalline aluminium nitride films were deposited on Si(100) substrates by RF reactive sputtering method. We have carried out experiments to evaluate the effect of stress in A1N thin films on the surface acoustic wave (SAW) velocity by studying A1N films with various thickness (100 nm to 3 mu m). Experimental results show a clear dependence of the residual stress in A1N films on SAW velocity of AlN/silicon structure. Optical properties of films were investigated by Fourier transform infrared absorbance spec-troscopy (FTIR). The obtained spectra show absorption bands attributed to vibrational modes of Al- N bonds, in particular El (TO) at 678 cm~(-1) and Al(TO) at 620 cm~(-1). The microstructural analysis were realised by field emission scanning electron microscopy (FESEM) and transmission electron microscopy (TEM) and show a columnar structure of AlN films and very dense and crack free films. The analysis of A1N films orientation by X-ray diffraction (XRD) exhibits a (002) high preferred orientation. We have shown that the grain size determined from TEM and FESEM characterisations, increases with film thickness. The AlN/Si SAW filter performed with the film presenting the lower residual stress exhibits the fundamental and third harmonic of resonance frequency of 212 MHz and 629 MHz respectively with very practical suppression band, taking into account the low electromechanical coupling coefficient of AIN/Si layered structure predicted by calculation.
机译:通过射频反应溅射法将多晶氮化铝膜沉积在Si(100)衬底上。我们已经进行了实验,通过研究各种厚度(100 nm至3μm)的AlN薄膜来评估AlN薄膜中的应力对声表面波(SAW)速度的影响。实验结果表明,AlN薄膜中残余应力与AlN /硅结构的SAW速度明显相关。通过傅立叶变换红外吸收光谱法(FTIR)研究了膜的光学性质。所获得的光谱显示归因于Al-N键的振动模式的吸收带,特别是在678cm-1(-1)处的El(TO)和在620cm-1(-1)处的Al(TO)。通过场发射扫描电子显微镜(FESEM)和透射电子显微镜(TEM)进行了显微结构分析,结果表明AlN薄膜和非常致密且无裂纹的薄膜呈柱状结构。通过X射线衍射(XRD)分析AlN膜的取向显示出(002)高的优选取向。我们已经表明,由TEM和FESEM表征确定的晶粒尺寸随膜厚的增加而增加。考虑到AIN / Si层的机电耦合系数很低,用具有较低残余应力的薄膜执行的AlN / Si SAW滤波器分别具有212 MHz和629 MHz的谐振频率的基波和三次谐波,具有非常实用的抑制带。通过计算预测的结构。

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