首页> 外文期刊>Journal of Ceramic Processing Research. (Text in English) >Thin film fabrication of CdS quantum dots on GaAs substrate by surfactant self-assembly
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Thin film fabrication of CdS quantum dots on GaAs substrate by surfactant self-assembly

机译:表面活性剂自组装通过表面活性剂自组装在GaAs衬底上的CDS量子点的薄膜制备

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In this study, cadmium sulfide (CdS) quantum dots (QDs) were synthesized using a microemulsion-based synthesis method, in which two microemulsions containing precursors of Cd2+ and S2-, were mixed to form CdS QDs. The time-course variation in the average particle size was measured by UV-visible absorption spectroscopy. Subsequently, a thin film of CdS QDs was fabricated using a self-assembled monolayer (SAM) technique. First, undoped GaAs (100) wafers were cleaned and etched using HCl aqueous solution, and a SAM of 1,6-hexanedithiol was formed on the etched wafer surface using a typical SAM technique. Finally, CdS-dithiol-GaAs structures were fabricated by immersing the SAM-coated wafer in dispersion solutions of CdS QDs. In the serial steps of the fabrication of CdS QD thin films, the wafer surface was analyzed, and thin film formation was confirmed by contact angle measurement, atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS).
机译:在该研究中,使用微乳液的合成方法合成硫化镉(Cds)量子点(QDS),其中将含有CD2 +和S2-的前体的两种微乳液混合以形成Cds QD。 通过UV可见的吸收光谱法测量平均粒度的时间过程变化。 随后,使用自组装的单层(SAM)技术制造CDS QD的薄膜。 首先,使用HCl水溶液清洁并蚀刻未掺杂的GaAs(100)晶片,并使用典型的SAM技术在蚀刻的晶片表面上形成1,6-己二醇的SAM。 最后,通过将SAM涂覆的晶片浸入CDS QDS的分散溶液中来制造CDS-DITHIOL-GAAs结构。 在CDS QD薄膜的制造的序列步骤中,分析晶片表面,通过接触角测量,原子力显微镜(AFM)和X射线光电子谱(XPS)确认薄膜形成。

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