首页> 外文期刊>Journal of Nanoelectronics and Optoelectronics >Threshold Voltage Modeling of Double Gate-All-Around Metal-Oxide-Semiconductor Field-Effect-Transistors (DGAA MOSFETs) Including the Fringing Field Effects
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Threshold Voltage Modeling of Double Gate-All-Around Metal-Oxide-Semiconductor Field-Effect-Transistors (DGAA MOSFETs) Including the Fringing Field Effects

机译:双栅全围绕金属氧化物半导体场效应晶体管(DGAA MOSFET)的阈值电压建模,包括流苏局部效应

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摘要

In this paper, an analytical threshold voltage model of double gate-all-around metal-oxide-semiconductor-field-effect-transistors (DGAA MOSFETs) including the fringing field effects is developed. The total fringing capacitance arising due to induced fringing fields in the device is divided into inner, outer and bottom fringing capacitance. A simple expression for each fringe capacitance is developed individually. The 3-D Poisson's equation has been solved in the channel region using the parabolic potential approximation method to develop the surface potential expressions. The effects of fringing capacitances of inner and outer gates which causes charge induction in the source/drain regions have been incorporated within the developed surface potential expressions. The change in potential due to these induced charges of source/drain region along the channel is formulated and added with the developed surface potential expression at both surfaces. The obtained modified surface potential equations have been utilized to derive the expression of the threshold voltage of the device. The performance of the proposed model has been compared with the previously developed model of DGAA MOSFET structure without High-k dielectrics. The effects of variation of device parameters on the threshold voltage have been also analyzed. The accuracy of the proposed model has been verified by numerical simulation results obtained by a device simulator VTCAD from Cogenda Int.
机译:在本文中,开发了一种包括流场效应的双栅全围绕金属氧化物 - 半导体 - 场效应晶体管(DGAA MOSFET)的分析阈值电压模型。由于设备中的诱导的条纹领域而产生的总配线电容被分成内部,外部和底部配合电容。每个边缘电容的简单表达是单独开发的。使用抛物线电位近似方法在沟道区中解决了3-D泊松的等式,以发展表面势表达。在发育表面电位表达中结合在源极/漏极区域中引起电荷感应的内部和外栅的流动电容的影响。由沿着通道的这些诱导的源/漏区电荷引起的电势的变化被配制并在两个表面的显影表面电位表达式中加入。已经利用所获得的修改表面电位方程来导出装置的阈值电压的表达。已经将所提出的模型的性能与先前开发的DGAA MOSFET结构模型进行了比较,而没有高k电介质。还分析了装置参数变化对阈值电压的影响。通过从Cogenda int获得的设备模拟器VTCAD获得的数值模拟结果验证了所提出的模型的准确性。

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