The Band Structure of Submonolayer Thorium Coatings on a Silicon Oxide Surface

摘要

Data are reported on the electronic structure of thorium-containing clusters formed on the surface of natural silicon oxide via electrochemical deposition. The mutual arrangement of bands in the clusters and silicon oxide substrate is restored with the use of X-ray photoelectron spectroscopy and electron energy loss spectroscopy. It is concluded that the studied cluster/substrate system may be promising for investigating the low-lying isomeric nuclear transition in Th-229 isotope.