A catalytic coating processes for structured substrate surfaces and with a silicon dioxide - thin film coated substrate with a structured surface

摘要

The present invention provides a coating process for patterned substrate surfaces, in which a substrate ( 101 ) is provided, the substrate having a surface ( 105 ) which is patterned in a substrate patterning region ( 102 ) and has one or more trenches ( 106 ) that are to be filled to a predetermined filling height ( 205 ), a catalyst layer ( 201 ) is introduced into the trenches ( 106 ) that are to be filled, a reaction layer ( 202 ) is deposited catalytically in the trenches ( 106 ) that are to be filled, the catalytically deposited reaction layer ( 202 ) is densified in the trenches ( 106 ) that are to be filled, and the introduction of the catalyst layer ( 201 ) and the catalytic deposition of the reaction layer ( 202 ) are repeated until the trenches ( 106 ) that are to be filled have been filled to the predetermined filling height ( 205 ).