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Highly Efficient Silicon Nanowire Surface Passivation by Bismuth Nano-Coating for Multifunctional Bi@SiNWs Heterostructures

机译:高效的硅纳米线表面钝化通过铋纳米涂层用于多功能Bi @ Sinws异质结构

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摘要

A key requirement for the development of highly efficient silicon nanowires (SiNWs) for use in various kinds of cutting-edge applications is the outstanding passivation of their surfaces. In this vein, we report on a superior passivation of a SiNWs surface by bismuth nano-coating (BiNC) for the first time. A metal-assisted chemical etching technique was used to produce the SiNW arrays, while the BiNCs were anchored on the NWs through thermal evaporation. The systematic studies by Scanning Electron Microscopy (SEM), energy dispersive X-ray spectra (EDX), and Fourier Transform Infra-Red (FTIR) spectroscopies highlight the successful decoration of SiNWs by BiNC. The photoluminescence (PL) emission properties of the samples were studied in the visible and near-infrared (NIR) spectral range. Interestingly, nine-fold visible PL enhancement and NIR broadband emission were recorded for the Bi-modified SiNWs. To our best knowledge, this is the first observation of NIR luminescence from Bi-coated SiNWs (Bi@SiNWs), and thus sheds light on a new family of Bi-doped materials operating in the NIR and covering the important telecommunication wavelengths. Excellent anti-reflectance abilities of ~10% and 8% are observed for pure SiNWs and Bi@SiNWs, respectively, as compared to the Si wafer (50–90%). A large decrease in the recombination activities is also obtained from Bi@SiNWs heterostructures. The reasons behind the superior improvement of the Bi@SiNWs performance are discussed in detail. The findings demonstrate the effectiveness of Bi as a novel surface passivation coating, where Bi@SiNWs heterostructures are very promising and multifunctional for photovoltaics, optoelectronics, and telecommunications.
机译:用于各种尖端应用的高效硅纳米线(SINW)的开发的关键要求是其表面的突出钝化。在这静脉中,我们首次通过铋纳米涂层(BINC)来报告SINWS表面的优异钝化。使用金属辅助化学蚀刻技术来生产SINW阵列,而BINCS通过热蒸发锚定在NW上。通过扫描电子显微镜(SEM),能量分散X射线光谱(EDX)和傅里叶变换红外(FTIR)光谱通过扫描系统研究突出了BINCS的成功装饰。在可见光和近红外(NIR)光谱范围内研究样品的光致发光(PL)排放性能。有趣的是,为双改性的SINWS记录了九倍可见的PL增强和NIR宽带排放。为了我们的最佳知识,这是第一次观察来自双涂层的Sinws(Bi @ Sinws)的NIR发光,因此在NIR中运行的新型双掺杂材料的新系列和覆盖了重要的电信波长。与Si晶片(50-90%)相比,纯Sinws和Bi @ Sinws分别观察到〜10%和8%的优异抗反射能力。还从Bi @ Sinws异质结构中获得了重组活性的大量减少。详细讨论了BI @ Sinws性能卓越的原因。该研究结果证明了BI作为新型表面钝化涂层的有效性,其中Bi @ Sinws异质结构对于光伏,光电子和电信非常有前景和多功能。

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