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Molecular doping of ZnO by ammonia: a possible shallow acceptor

机译:氨对ZnO的分子掺杂:可能的浅受体

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Stable p-type doping of ZnO has been a major technical barrier for the application of ZnO in optoelectronic devices. While p-type conductivity for nitrogen-doped ZnO has been repeatedly reported, its origin remains mysterious. Here, using first-principles calculation, we predict that an ammonia molecule could counterintuitively assume a Zn site and form a substitutional defect, (NH3)(Zn). By comparing with other molecular dopants (N-2 and NO) on the Zn site and N on the O site (NO), we found that (NH3)(Zn) is thermodynamically the most stable defect under O-rich conditions. The stability is attributed to the formation of a strong dative bond of the ammonia molecule with a neighbouring O atom. The (NH3)(Zn) defect is neutral regardless of the Fermi level of the system, but it can capture a H donor forming (NH4)(Zn), which becomes an acceptor. Experimental evidence for the existence of this Zn-site N acceptor is provided based on a comparison of calculated and measured N 1s X-ray photoelectron spectra. Accurately calculating the (0/-) transition level for this and other N-based acceptors has been hindered by the theoretical method used. Experimental studies are called for to clarify its (0/-) transition level.
机译:稳定的ZnO的p型掺杂一直是将ZnO应用于光电器件的主要技术障碍。尽管反复报道了氮掺杂ZnO的p型电导率,但其起源仍然是个谜。在这里,使用第一性原理计算,我们预测一个氨分子可以反常地假定一个Zn位点并形成一个取代缺陷(NH3)(Zn)。通过与Zn位点上的其他分子掺杂剂(N-2和NO)和O位点上的N(NO)进行比较,我们发现(NH3)(Zn)在富氧条件下是热力学上最稳定的缺陷。稳定性归因于氨分子与相邻的O原子形成牢固的键合。不管系统的费米能级如何,(NH3)(Zn)缺陷都是中性的,但它可以捕获形成(NH4)(Zn)的H供体,后者成为受体。基于计算和测量的N 1s X射线光电子能谱的比较,提供了该Zn位氮受体存在的实验证据。所用的理论方法阻碍了为此和其他基于N的受体准确计算(0 /-)跃迁水平。需要进行实验研究以阐明其(0 /-)过渡水平。

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