Catalyst-Free Metal-Organic Chemical Vapor Deposition Growth of InN Nanorods

摘要

We demonstrated the successful growth of catalyst-free InN nanorods on (0001) Al_2O_3 substrates using metal-organic chemical vapor deposition. Morphological evolution was significantly affected by growth temperature. At 710℃, complete InN nanorods with typical diameters of 150 nm and length of ～3.5 μm were grown with hexagonal facets. θ-2θ X-ray diffraction measurement shows that (0002) InN nanorods grown on (0001) Al_2O_3 substrates were vertically aligned along c-axis. In addition, high resolution transmission electron microscopy indicates the spacing of the (0001) lattice planes is 0.28 nm, which is very close to that of bulk InN. The electron diffraction patterns also revealed that the InN nanorods are single crystalline with a growth direction along <0001> with (10-10) facets.